Cargando…
MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS
A focused ion beam of gallium ions (Ga+) is used to perform micro- and nano-machining of a sample’s surface through the removal of atoms, without altering the sample’s properties. In combination with scanning electron microscopy (SEM) and various detectors, the ion beam allows us to study the micros...
| Autor principal: | |
|---|---|
| Lenguaje: | eng-fre |
| Publicado: |
2019
|
| Acceso en línea: | http://cds.cern.ch/record/2692815 |
| _version_ | 1780963967245484032 |
|---|---|
| author | Vanden Broeck, Renilde |
| author_facet | Vanden Broeck, Renilde |
| author_sort | Vanden Broeck, Renilde |
| collection | CERN |
| description | A focused ion beam of gallium ions (Ga+) is used to perform micro- and nano-machining of a sample’s surface through the removal of atoms, without altering the sample’s properties. In combination with scanning electron microscopy (SEM) and various detectors, the ion beam allows us to study the microstructure, topography and chemical composition of cross sections and/or volumes of a material. With the microscopy set in transmission mode (STEM), nanometric resolution can be achieved. |
| id | cern-2692815 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng-fre |
| publishDate | 2019 |
| record_format | invenio |
| spelling | cern-26928152019-10-09T21:52:57Zhttp://cds.cern.ch/record/2692815eng-freVanden Broeck, RenildeMATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISSA focused ion beam of gallium ions (Ga+) is used to perform micro- and nano-machining of a sample’s surface through the removal of atoms, without altering the sample’s properties. In combination with scanning electron microscopy (SEM) and various detectors, the ion beam allows us to study the microstructure, topography and chemical composition of cross sections and/or volumes of a material. With the microscopy set in transmission mode (STEM), nanometric resolution can be achieved.Poster-2019-798oai:cds.cern.ch:26928152019-09-19 |
| spellingShingle | Vanden Broeck, Renilde MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title | MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title_full | MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title_fullStr | MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title_full_unstemmed | MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title_short | MATERIALS LABORATORY - FOCUSED ION BEAM (FIB) XB540 BY ZEISS |
| title_sort | materials laboratory - focused ion beam (fib) xb540 by zeiss |
| url | http://cds.cern.ch/record/2692815 |
| work_keys_str_mv | AT vandenbroeckrenilde materialslaboratoryfocusedionbeamfibxb540byzeiss |