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Production of ultra-high-vacuum chambers with integrated getter thin-film coatings by electroforming

Titanium Zirconium Vanadium (TiZrV) thin film coatings are used in particle accelerators and synchrotron light sources to maintain ultra-high vacuum conditions. They are deposited on the internal walls of the vacuum chambers, transforming them from a gas source into a chemical pump. The trend in ele...

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Detalles Bibliográficos
Autor principal: Lain Amador, Lucia
Lenguaje:eng
Publicado: 2019
Materias:
Acceso en línea:https://dx.doi.org/10.17181/CERN.A2EJ.YIS2
http://cds.cern.ch/record/2693564