Physical design and mask synthesis for directed self-assembly lithography

Detalles Bibliográficos
Autores principales: Shim, Seongbo, Shin, Youngsoo
Lenguaje:eng
Publicado: Springer 2018
Materias:
Engineering
Acceso en línea:http://cds.cern.ch/record/2697921

Internet

http://cds.cern.ch/record/2697921

Ejemplares similares