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Physical design and mask synthesis for directed self-assembly lithography

Detalles Bibliográficos
Autores principales: Shim, Seongbo, Shin, Youngsoo
Lenguaje:eng
Publicado: Springer 2018
Materias:
Acceso en línea:http://cds.cern.ch/record/2697921
_version_ 1780964246274703360
author Shim, Seongbo
Shin, Youngsoo
author_facet Shim, Seongbo
Shin, Youngsoo
author_sort Shim, Seongbo
collection CERN
id cern-2697921
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2018
publisher Springer
record_format invenio
spelling cern-26979212021-04-21T18:18:19Zhttp://cds.cern.ch/record/2697921engShim, SeongboShin, YoungsooPhysical design and mask synthesis for directed self-assembly lithographyEngineeringSpringeroai:cds.cern.ch:26979212018
spellingShingle Engineering
Shim, Seongbo
Shin, Youngsoo
Physical design and mask synthesis for directed self-assembly lithography
title Physical design and mask synthesis for directed self-assembly lithography
title_full Physical design and mask synthesis for directed self-assembly lithography
title_fullStr Physical design and mask synthesis for directed self-assembly lithography
title_full_unstemmed Physical design and mask synthesis for directed self-assembly lithography
title_short Physical design and mask synthesis for directed self-assembly lithography
title_sort physical design and mask synthesis for directed self-assembly lithography
topic Engineering
url http://cds.cern.ch/record/2697921
work_keys_str_mv AT shimseongbo physicaldesignandmasksynthesisfordirectedselfassemblylithography
AT shinyoungsoo physicaldesignandmasksynthesisfordirectedselfassemblylithography