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Physical design and mask synthesis for directed self-assembly lithography
Autores principales: | , |
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Lenguaje: | eng |
Publicado: |
Springer
2018
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2697921 |
_version_ | 1780964246274703360 |
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author | Shim, Seongbo Shin, Youngsoo |
author_facet | Shim, Seongbo Shin, Youngsoo |
author_sort | Shim, Seongbo |
collection | CERN |
id | cern-2697921 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2018 |
publisher | Springer |
record_format | invenio |
spelling | cern-26979212021-04-21T18:18:19Zhttp://cds.cern.ch/record/2697921engShim, SeongboShin, YoungsooPhysical design and mask synthesis for directed self-assembly lithographyEngineeringSpringeroai:cds.cern.ch:26979212018 |
spellingShingle | Engineering Shim, Seongbo Shin, Youngsoo Physical design and mask synthesis for directed self-assembly lithography |
title | Physical design and mask synthesis for directed self-assembly lithography |
title_full | Physical design and mask synthesis for directed self-assembly lithography |
title_fullStr | Physical design and mask synthesis for directed self-assembly lithography |
title_full_unstemmed | Physical design and mask synthesis for directed self-assembly lithography |
title_short | Physical design and mask synthesis for directed self-assembly lithography |
title_sort | physical design and mask synthesis for directed self-assembly lithography |
topic | Engineering |
url | http://cds.cern.ch/record/2697921 |
work_keys_str_mv | AT shimseongbo physicaldesignandmasksynthesisfordirectedselfassemblylithography AT shinyoungsoo physicaldesignandmasksynthesisfordirectedselfassemblylithography |