Cargando…
Physical design and mask synthesis for directed self-assembly lithography
Autores principales: | Shim, Seongbo, Shin, Youngsoo |
---|---|
Lenguaje: | eng |
Publicado: |
Springer
2018
|
Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2697921 |
Ejemplares similares
-
Design for manufacturability with advanced lithography
por: Yu, Bei, et al.
Publicado: (2016) -
EUV lithography
por: Bakshi, Vivek
Publicado: (2018) -
Computational lithography
por: Ma, Xu, et al.
Publicado: (2010) -
Nano lithography
por: Landis, Stefan
Publicado: (2013) -
Directed Self-Assembly of Polystyrene Nanospheres by Direct Laser-Writing Lithography
por: Cara, Eleonora, et al.
Publicado: (2020)