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Handbook of silicon wafer cleaning technology
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal as...
| Autores principales: | , |
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| Lenguaje: | eng |
| Publicado: |
Elsevier
2018
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| Acceso en línea: | http://cds.cern.ch/record/2703506 |