High power impulse magnetron sputtering: fundamentals, technologies, challenges and applications

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film char...

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Detalles Bibliográficos
Autores principales: Lundin, Daniel, Minea, Tiberiu, Gudmundsson, Jon Tomas
Lenguaje:eng
Publicado: Elsevier 2019
Materias:
Nuclear Physics - Experiment
Acceso en línea:http://cds.cern.ch/record/2711304

Internet

http://cds.cern.ch/record/2711304

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