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High spatial resolution monolithic pixel detector in SOI technology
This paper presents test-beam results of monolithic pixel detector prototypes fabricated in 200 nm Silicon-On-Insulator (SOI) CMOS technology studied in the context of high spatial resolution performance. The tested detectors were fabricated on a 500 μm thick high-resistivity Floating Zone type n (F...
Autores principales: | Bugiel, R, Bugiel, S, Dannheim, D, Fiergolski, A, Hynds, D, Idzik, M, Kapusta, P, Kucewicz, W, Munker, M, Nurnberg, A, Spannagel, S, Świentek, K |
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Lenguaje: | eng |
Publicado: |
2021
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/j.nima.2020.164897 http://cds.cern.ch/record/2727594 |
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