High-k gate dielectric materials: applications with advanced metal oxide semiconductor field effect transistors (mosfets)

Detalles Bibliográficos
Autores principales: Pratap Maity, Niladri, Maity, Reshmi, Baishya, Srimanta
Lenguaje:eng
Publicado: Apple Academic Press 2020
Materias:
XX
Acceso en línea:http://cds.cern.ch/record/2762779

Internet

http://cds.cern.ch/record/2762779

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