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Niobium thin film thickness profile tailoring on complex shape substrates using unbalanced biased High Power Impulse Magnetron Sputtering
The authors report in this paper the possibility to control the thickness profile of a thin film deposited by High Power Impulse Magnetron Sputtering (HiPIMS). It is shown that the combination between a HiPIMS discharge, an unbalanced magnetic configuration and the application of a negative bias ont...
| Autores principales: | , , , , |
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| Lenguaje: | eng |
| Publicado: |
2022
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/j.surfcoat.2022.128306 http://cds.cern.ch/record/2803905 |