NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies

Detalles Bibliográficos
Autores principales: Gentili, Massimo, Giovannella, Carlo, Selci, Stefano
Lenguaje:eng
Publicado: Kluwer 1994
Materias:
Other Fields of Physics
Acceso en línea:http://cds.cern.ch/record/280542

Internet

http://cds.cern.ch/record/280542

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