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NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies

Detalles Bibliográficos
Autores principales: Gentili, Massimo, Giovannella, Carlo, Selci, Stefano
Lenguaje:eng
Publicado: Kluwer 1994
Materias:
Acceso en línea:http://cds.cern.ch/record/280542
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author Gentili, Massimo
Giovannella, Carlo
Selci, Stefano
author_facet Gentili, Massimo
Giovannella, Carlo
Selci, Stefano
author_sort Gentili, Massimo
collection CERN
id cern-280542
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1994
publisher Kluwer
record_format invenio
spelling cern-2805422021-04-22T21:26:03Zhttp://cds.cern.ch/record/280542engGentili, MassimoGiovannella, CarloSelci, StefanoNATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray LithographiesOther Fields of PhysicsKluweroai:cds.cern.ch:2805421994
spellingShingle Other Fields of Physics
Gentili, Massimo
Giovannella, Carlo
Selci, Stefano
NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title_full NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title_fullStr NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title_full_unstemmed NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title_short NATO Advanced Research Workshop on Nanolithography: a Borderland between STM, EB, IB, and X-ray Lithographies
title_sort nato advanced research workshop on nanolithography: a borderland between stm, eb, ib, and x-ray lithographies
topic Other Fields of Physics
url http://cds.cern.ch/record/280542
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AT giovannellacarlo natoadvancedresearchworkshoponnanolithographyaborderlandbetweenstmebibandxraylithographies
AT selcistefano natoadvancedresearchworkshoponnanolithographyaborderlandbetweenstmebibandxraylithographies