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Digital Pixel Test Structures implemented in a 65 nm CMOS process

The ALICE ITS3 (Inner Tracking System 3) upgrade project and the CERN EP R&D on monolithic pixel sensors are investigating the feasibility of the Tower Partners Semiconductor Co. 65nm process for use in the next generation of vertex detectors. The ITS3 aims to employ wafer-scale Monolithic Activ...

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Detalles Bibliográficos
Autores principales: Rinella, Gianluca Aglieri, Andronic, Anton, Antonelli, Matias, Aresti, Mauro, Baccomi, Roberto, Becht, Pascal, Beole, Stefania, Braach, Justus, Buckland, Matthew Daniel, Buschmann, Eric, Camerini, Paolo, Carnesecchi, Francesca, Cecconi, Leonardo, Charbon, Edoardo, Contin, Giacomo, Dannheim, Dominik, de Melo, Joao, Deng, Wenjing, di Mauro, Antonello, Hasenbichler, Jan, Hillemanns, Hartmut, Hong, Geun Hee, Isakov, Artem, Junique, Antoine, Kluge, Alex, Kotliarov, Artem, Křížek, Filip, Lautner, Lukas, Mager, Magnus, Marras, Davide, Martinengo, Paolo, Masciocchi, Silvia, Menzel, Marius Wilm, Munker, Magdalena, Piro, Francesco, Rachevski, Alexandre, Rebane, Karoliina, Reidt, Felix, Russo, Roberto, Sanna, Isabella, Sarritzu, Valerio, Senyukov, Serhiy, Snoeys, Walter, Sonneveld, Jory, Šuljić, Miljenko, Svihra, Peter, Tiltmann, Nicolas, Usai, Gianluca, Van Beelen, Jacob Bastiaan, Vassilev, Mirella Dimitrova, Vernieri, Caterina, Villani, Anna
Lenguaje:eng
Publicado: 2022
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2023.168589
http://cds.cern.ch/record/2845385

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