Cargando…
Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking
Autores principales: | , , , , |
---|---|
Lenguaje: | eng |
Publicado: |
1990
|
Materias: | |
Acceso en línea: | http://cds.cern.ch/record/286778 |
_version_ | 1780888362531422208 |
---|---|
author | Jahn, S G Hofsäss, H C Wahl, U Winter, S Recknagel, E |
author_facet | Jahn, S G Hofsäss, H C Wahl, U Winter, S Recknagel, E |
author_sort | Jahn, S G |
collection | CERN |
id | cern-286778 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1990 |
record_format | invenio |
spelling | cern-2867782019-09-30T06:29:59Zhttp://cds.cern.ch/record/286778engJahn, S GHofsäss, H CWahl, UWinter, SRecknagel, EAnnealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blockingOther Fields of Physicsoai:cds.cern.ch:2867781990 |
spellingShingle | Other Fields of Physics Jahn, S G Hofsäss, H C Wahl, U Winter, S Recknagel, E Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title | Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title_full | Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title_fullStr | Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title_full_unstemmed | Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title_short | Annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
title_sort | annealing behaviour of compound semiconductors after ion implantation investigated by emission-channeling and blocking |
topic | Other Fields of Physics |
url | http://cds.cern.ch/record/286778 |
work_keys_str_mv | AT jahnsg annealingbehaviourofcompoundsemiconductorsafterionimplantationinvestigatedbyemissionchannelingandblocking AT hofsasshc annealingbehaviourofcompoundsemiconductorsafterionimplantationinvestigatedbyemissionchannelingandblocking AT wahlu annealingbehaviourofcompoundsemiconductorsafterionimplantationinvestigatedbyemissionchannelingandblocking AT winters annealingbehaviourofcompoundsemiconductorsafterionimplantationinvestigatedbyemissionchannelingandblocking AT recknagele annealingbehaviourofcompoundsemiconductorsafterionimplantationinvestigatedbyemissionchannelingandblocking |