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Application of a pulsed, RF-driven, multicusp source for low energy plasma immersion ion implantation

Detalles Bibliográficos
Autores principales:	Wengrow, A B, Leung, K N, Perkins, L T, Pickard, D S, Rickard, M, Williams, M D, Tucker, M
Lenguaje:	eng
Publicado:	1996
Materias:	Accelerators and Storage Rings
Acceso en línea:	http://cds.cern.ch/record/311287

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