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High laser damage threshold $HfO_{2}/SiO_{2}$ mirrors manufactured by sputtering process

Detalles Bibliográficos
Autores principales:	Fornier, A, Bernardino, D, Iam, O, Néauport, J, Dufour, F, Schmitt, B, Mackowski, J M
Lenguaje:	eng
Publicado:	1998
Materias:	Engineering
Acceso en línea:	http://cds.cern.ch/record/369951

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