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Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy

Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existence of one deep trapping level for electrons and two deep trapping levels for holes was put into evidence, using this method, in proton irradiated p/sup +/-n-n/sup +/ silicon structures. An analytical f...

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Detalles Bibliográficos
Autores principales: Pintilie, I, Tivarus, C, Botila, T, Petre, D
Lenguaje:eng
Publicado: 2000
Materias:
Acceso en línea:https://dx.doi.org/10.1016/S0168-9002(99)00887-6
http://cds.cern.ch/record/427353