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Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy
Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existence of one deep trapping level for electrons and two deep trapping levels for holes was put into evidence, using this method, in proton irradiated p/sup +/-n-n/sup +/ silicon structures. An analytical f...
Autores principales: | , , , |
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Lenguaje: | eng |
Publicado: |
2000
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/S0168-9002(99)00887-6 http://cds.cern.ch/record/427353 |
_version_ | 1780895133202382848 |
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author | Pintilie, I Tivarus, C Botila, T Petre, D |
author_facet | Pintilie, I Tivarus, C Botila, T Petre, D |
author_sort | Pintilie, I |
collection | CERN |
description | Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existence of one deep trapping level for electrons and two deep trapping levels for holes was put into evidence, using this method, in proton irradiated p/sup +/-n-n/sup +/ silicon structures. An analytical formula for the OCS discharging current for this type of structures was deduced. (19 refs). |
id | cern-427353 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2000 |
record_format | invenio |
spelling | cern-4273532019-09-30T06:29:59Zdoi:10.1016/S0168-9002(99)00887-6http://cds.cern.ch/record/427353engPintilie, ITivarus, CBotila, TPetre, DExperimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopyDetectors and Experimental TechniquesOptical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existence of one deep trapping level for electrons and two deep trapping levels for holes was put into evidence, using this method, in proton irradiated p/sup +/-n-n/sup +/ silicon structures. An analytical formula for the OCS discharging current for this type of structures was deduced. (19 refs).oai:cds.cern.ch:4273532000 |
spellingShingle | Detectors and Experimental Techniques Pintilie, I Tivarus, C Botila, T Petre, D Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title | Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title_full | Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title_fullStr | Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title_full_unstemmed | Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title_short | Experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n Si junctions using optical charging spectroscopy |
title_sort | experimental evidence of deep electron and hole trapping levels in high fluence proton irradiated p-n si junctions using optical charging spectroscopy |
topic | Detectors and Experimental Techniques |
url | https://dx.doi.org/10.1016/S0168-9002(99)00887-6 http://cds.cern.ch/record/427353 |
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