Study of the discharge gas trapping during thin film growth

Mostrar otras versiones (1)

Discharge gas trapping in thin films produced by sputtering is known to be due to high energy neutrals bouncing back from the cathode. Qualitatively, the phenomenon is enhanced by raising the discharge voltage and is strongly dependent on the atomic masses of the discharge gas and of the cathode mat...

Descripción completa

Detalles Bibliográficos
Autores principales: Calatroni, Sergio, Amorosi, S, Anderle, M, Benvenuti, Cristoforo, Carver, J, Chiggiato, P, Neupert, H, Vollenberg, W
Lenguaje:eng
Publicado: 1999
Materias:
Engineering
Acceso en línea:http://cds.cern.ch/record/437646

Internet

http://cds.cern.ch/record/437646

Ejemplares similares