Lowering the activation temperature of TiZrV non-evaporable getter films

In order to reduce the activation temperature of the TiZrV alloy, thin films of various compositions were produced by three-cathode magnetron sputtering on stainless steel substrates. For the characterisation of the activation behaviour the surface chemical composition has been monitored by Auger Electron Spectroscopy (AES) during specific in situ thermal cycles. The volume elemental composition of the film has been measured by Energy Dispersive X-ray spectroscopy (EDX) and the morphology (crystal structure and size of the crystallites) has been investigated by X-ray diffraction (XRD). The criteria indicating the sample quality and its dependence on film structure and chemical composition are presented and discussed.