Vacuum properties of TiZrV non-evaporable getter films

Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 °C. This activation temperature is the lowest of some 18 different getter coatings studied so far, and it allows the use of the getter thin film technology with aluminium alloy vacuum chambers, wh...

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Detalles Bibliográficos
Autores principales: Benvenuti, Cristoforo, Chiggiato, P, Costa-Pinto, P, Escudeiro-Santana, A, Hedley, T, Mongelluzzo, A, Ruzinov, V, Wevers, I
Lenguaje:eng
Publicado: 1999
Materias:
Accelerators and Storage Rings
Acceso en línea:http://cds.cern.ch/record/442323

Internet

http://cds.cern.ch/record/442323

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