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The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings

The secondary electron yield (SEY) of two different non evaporable getter (NEG) samples has been measured 'as received' and after thermal treatment. The investigated NEGs are TiZr and TiZrV thin film coatings of 1 mm thickness, which are sputter deposited onto copper substrates. The maximu...

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Detalles Bibliográficos
Autores principales: Scheuerlein, C, Henrist, Bernard, Hilleret, Noël, Taborelli, M
Lenguaje:eng
Publicado: 2000
Materias:
Acceso en línea:https://dx.doi.org/10.1016/S0169-4332(00)00838-2
http://cds.cern.ch/record/480261
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author Scheuerlein, C
Henrist, Bernard
Hilleret, Noël
Taborelli, M
author_facet Scheuerlein, C
Henrist, Bernard
Hilleret, Noël
Taborelli, M
author_sort Scheuerlein, C
collection CERN
description The secondary electron yield (SEY) of two different non evaporable getter (NEG) samples has been measured 'as received' and after thermal treatment. The investigated NEGs are TiZr and TiZrV thin film coatings of 1 mm thickness, which are sputter deposited onto copper substrates. The maximum SEY dmax of the air exposed TiZr and TiZrV coating decreases from above 2.0 to below 1.1 during a 2 hour heat treatment at 250 °C and 200 °C, respectively. Saturating an activated TiZrV surface under vacuum with the gases typically present in ultra high vacuum systems increases dmax by about 0.1. Changes in elemental surface composition during the applied heat treatments were monitored by Auger electron spectroscopy (AES). After activation carbon, oxygen and chlorine were detected on the NEG surfaces. The potential of AES for detecting the surface modifications which cause the reduction of SE emission during the applied heat treatments is critically discussed.
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language eng
publishDate 2000
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spelling cern-4802612019-09-30T06:29:59Zdoi:10.1016/S0169-4332(00)00838-2http://cds.cern.ch/record/480261engScheuerlein, CHenrist, BernardHilleret, NoëlTaborelli, MThe secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatingsEngineeringThe secondary electron yield (SEY) of two different non evaporable getter (NEG) samples has been measured 'as received' and after thermal treatment. The investigated NEGs are TiZr and TiZrV thin film coatings of 1 mm thickness, which are sputter deposited onto copper substrates. The maximum SEY dmax of the air exposed TiZr and TiZrV coating decreases from above 2.0 to below 1.1 during a 2 hour heat treatment at 250 °C and 200 °C, respectively. Saturating an activated TiZrV surface under vacuum with the gases typically present in ultra high vacuum systems increases dmax by about 0.1. Changes in elemental surface composition during the applied heat treatments were monitored by Auger electron spectroscopy (AES). After activation carbon, oxygen and chlorine were detected on the NEG surfaces. The potential of AES for detecting the surface modifications which cause the reduction of SE emission during the applied heat treatments is critically discussed.CERN-EST-2000-007-SMoai:cds.cern.ch:4802612000-11-15
spellingShingle Engineering
Scheuerlein, C
Henrist, Bernard
Hilleret, Noël
Taborelli, M
The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title_full The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title_fullStr The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title_full_unstemmed The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title_short The secondary electron yield of TiZr and TiZrV non evaporable getter thin film coatings
title_sort secondary electron yield of tizr and tizrv non evaporable getter thin film coatings
topic Engineering
url https://dx.doi.org/10.1016/S0169-4332(00)00838-2
http://cds.cern.ch/record/480261
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