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Bias dependence and bistability of radiation defects in silicon
Influence of bias on effective dopant concentration in neutron and pion irradiated$p^+ - n - n^+$ diodes has been measured. Detailed studies of annealing of the bias-induced damagehave revealed three components, with introduction rates from 0.005 to 0.008 cm$^{-1}$ andannealing time constants rangin...
Autores principales: | , , , |
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Lenguaje: | eng |
Publicado: |
2000
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/S0168-9002(01)00584-8 http://cds.cern.ch/record/516836 |
Sumario: | Influence of bias on effective dopant concentration in neutron and pion irradiated$p^+ - n - n^+$ diodes has been measured. Detailed studies of annealing of the bias-induced damagehave revealed three components, with introduction rates from 0.005 to 0.008 cm$^{-1}$ andannealing time constants ranging from 5 to 1000 hours at 20$^\circ$C. Variation of annealing temperatures yielded activation energies around 1 eV for all the three components. Bistable behavior of radiation damage under bias has been observed and its activation and annealingstudied. The bistable damage was associated to the fastest annealing component of bias-induced damage.Using the parameterization obtained, a prediction for ATLAS SCT operation was made.Bias-induced damage is shown to require an additional 80 V to fully deplete detectors at the end of LHC operation. |
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