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Handbook of chemical vapor deposition: principles, technology and applications
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es...
| Autor principal: | |
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| Lenguaje: | eng |
| Publicado: |
Noyes
1999
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/643994 |
| _version_ | 1780900792891342848 |
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| author | Pierson, Hugh O |
| author_facet | Pierson, Hugh O |
| author_sort | Pierson, Hugh O |
| collection | CERN |
| description | Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest |
| id | cern-643994 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 1999 |
| publisher | Noyes |
| record_format | invenio |
| spelling | cern-6439942021-04-22T02:36:43Zhttp://cds.cern.ch/record/643994engPierson, Hugh OHandbook of chemical vapor deposition: principles, technology and applicationsEngineeringTurn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest Noyesoai:cds.cern.ch:6439941999 |
| spellingShingle | Engineering Pierson, Hugh O Handbook of chemical vapor deposition: principles, technology and applications |
| title | Handbook of chemical vapor deposition: principles, technology and applications |
| title_full | Handbook of chemical vapor deposition: principles, technology and applications |
| title_fullStr | Handbook of chemical vapor deposition: principles, technology and applications |
| title_full_unstemmed | Handbook of chemical vapor deposition: principles, technology and applications |
| title_short | Handbook of chemical vapor deposition: principles, technology and applications |
| title_sort | handbook of chemical vapor deposition: principles, technology and applications |
| topic | Engineering |
| url | http://cds.cern.ch/record/643994 |
| work_keys_str_mv | AT piersonhugho handbookofchemicalvapordepositionprinciplestechnologyandapplications |