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Low level RF systems for synchrotrons: part II: High Intensity. Compensation of the beam induced effects
The high intensity regime is reached when the voltage induced by the beam in the RF cavities is of an amplitude comparable to the desired accelerating voltage. In steady state this beam loading can be compensated by providing extra RF power. Transient beam loading occurs at injection or in the prese...
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| Lenguaje: | eng |
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CERN
2001
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| Acceso en línea: | https://dx.doi.org/10.5170/CERN-2005-003.175 http://cds.cern.ch/record/702662 |