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An electron-multiplying "Micromegas" grid made in silicon wafer post-processing technology

A technology for manufacturing an aluminium grid onto a silicon wafer has been developed. The grid is fixed parallel and precisely to the wafer (anode) surface at a distance of 50 \mum by means of insulating pillars. When some 400 V are applied between the grid and (anode) wafer, gas multiplication...

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Detalles Bibliográficos
Autores principales: Chefdeville, M, Colas, P, Giomataris, Ioanis, van der Graaf, H, Heijne, Erik H M, Van der Putten, S, Salm, C, Schmitz, J, Smits, S, Timmermans, J, Visschers, J L
Lenguaje:eng
Publicado: 2005
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2005.11.065
http://cds.cern.ch/record/893063