Cargando…
An electron-multiplying "Micromegas" grid made in silicon wafer post-processing technology
A technology for manufacturing an aluminium grid onto a silicon wafer has been developed. The grid is fixed parallel and precisely to the wafer (anode) surface at a distance of 50 \mum by means of insulating pillars. When some 400 V are applied between the grid and (anode) wafer, gas multiplication...
Autores principales: | Chefdeville, M, Colas, P, Giomataris, Ioanis, van der Graaf, H, Heijne, Erik H M, Van der Putten, S, Salm, C, Schmitz, J, Smits, S, Timmermans, J, Visschers, J L |
---|---|
Lenguaje: | eng |
Publicado: |
2005
|
Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/j.nima.2005.11.065 http://cds.cern.ch/record/893063 |
Ejemplares similares
-
The detection of single electrons by means of a Micromegas-covered MediPix2 pixel CMOS readout circuit
por: Campbell, M, et al.
Publicado: (2004) -
Detection of single electrons by means of a Micromegas-covered Medi Pix2 pixel CMOS readout circuit
por: Campbell, Michael, et al.
Publicado: (2005) -
The readout of a GEM- or micromegas-equipped TPC by beams of the medipix2 CMOS sensor as direct anode
por: Colas, P, et al.
Publicado: (2004) -
An integrated readout system for drift chambers: The application of monolithic CMOS pixel sensors as segmented direct anode
por: Campbell, M, et al.
Publicado: (2006) -
Spatial resolution and rate capability of MICROMEGAS detector
por: Derré, J, et al.
Publicado: (2001)