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Lattice sites of implanted Fe in Si

The angular distribution of $\beta^{-}$-particles emitted by the radioactive isotope $^{59}$Fe was monitored following implantation into Si single crystals at fluences from $1.4 \times 10^{12}$ cm$^{-2}$ to $1 \times 10^{14}$ cm$^{-2}$. We identified Fe on three distinct sites: ideal substitutional,...

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Detalles Bibliográficos
Autores principales: Wahl, Ulrich, Correia, J G, Rita, E, Araújo, João Pedro, Carvalho-Soares, José
Lenguaje:eng
Publicado: 2005
Materias:
Acceso en línea:https://dx.doi.org/10.1103/PhysRevB.72.014115
http://cds.cern.ch/record/985354
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author Wahl, Ulrich
Correia, J G
Rita, E
Araújo, João Pedro
Carvalho-Soares, José
author_facet Wahl, Ulrich
Correia, J G
Rita, E
Araújo, João Pedro
Carvalho-Soares, José
author_sort Wahl, Ulrich
collection CERN
description The angular distribution of $\beta^{-}$-particles emitted by the radioactive isotope $^{59}$Fe was monitored following implantation into Si single crystals at fluences from $1.4 \times 10^{12}$ cm$^{-2}$ to $1 \times 10^{14}$ cm$^{-2}$. We identified Fe on three distinct sites: ideal substitutional, displaced substitutional and displaced tetrahedral interstitial. Whereas displaced substitutional Fe was dominating for annealing temperatures below 500 °C, annealing between 500-700 °C caused the majority of Fe to occupy displaced tetrahedral interstitial sites. Ideal substitutional positions were increasingly populated following annealing at 800 °C and above. A comparison of the emission channeling results to Mössbauer and electron paramagnetic resonance experiments is given.
id cern-985354
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2005
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spelling cern-9853542019-09-30T06:29:59Zdoi:10.1103/PhysRevB.72.014115http://cds.cern.ch/record/985354engWahl, UlrichCorreia, J GRita, EAraújo, João PedroCarvalho-Soares, JoséLattice sites of implanted Fe in SiCondensed MatterThe angular distribution of $\beta^{-}$-particles emitted by the radioactive isotope $^{59}$Fe was monitored following implantation into Si single crystals at fluences from $1.4 \times 10^{12}$ cm$^{-2}$ to $1 \times 10^{14}$ cm$^{-2}$. We identified Fe on three distinct sites: ideal substitutional, displaced substitutional and displaced tetrahedral interstitial. Whereas displaced substitutional Fe was dominating for annealing temperatures below 500 °C, annealing between 500-700 °C caused the majority of Fe to occupy displaced tetrahedral interstitial sites. Ideal substitutional positions were increasingly populated following annealing at 800 °C and above. A comparison of the emission channeling results to Mössbauer and electron paramagnetic resonance experiments is given.CERN-OPEN-2006-041oai:cds.cern.ch:9853542005-07-14
spellingShingle Condensed Matter
Wahl, Ulrich
Correia, J G
Rita, E
Araújo, João Pedro
Carvalho-Soares, José
Lattice sites of implanted Fe in Si
title Lattice sites of implanted Fe in Si
title_full Lattice sites of implanted Fe in Si
title_fullStr Lattice sites of implanted Fe in Si
title_full_unstemmed Lattice sites of implanted Fe in Si
title_short Lattice sites of implanted Fe in Si
title_sort lattice sites of implanted fe in si
topic Condensed Matter
url https://dx.doi.org/10.1103/PhysRevB.72.014115
http://cds.cern.ch/record/985354
work_keys_str_mv AT wahlulrich latticesitesofimplantedfeinsi
AT correiajg latticesitesofimplantedfeinsi
AT ritae latticesitesofimplantedfeinsi
AT araujojoaopedro latticesitesofimplantedfeinsi
AT carvalhosoaresjose latticesitesofimplantedfeinsi