Cargando…
Second-order generation of point defects in highly irradiated float zone silicon—annealing studies
Isothermal and isochronal annealing experiments have shown that the I defect (the main cause for the changes in silicon diodes characteristics after high levels of gamma-irradiation) is stable up to 325–350°C. Possible reactions, which can explain the behavior of different defects formed during the...
Autores principales: | , , , , , |
---|---|
Lenguaje: | eng |
Publicado: |
2003
|
Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/j.physb.2003.09.131 http://cds.cern.ch/record/2634251 |
_version_ | 1780959728123248640 |
---|---|
author | Pintilie, I Fretwurst, E Kramberger, G Lindstroem, G Li, Z Stahl, J |
author_facet | Pintilie, I Fretwurst, E Kramberger, G Lindstroem, G Li, Z Stahl, J |
author_sort | Pintilie, I |
collection | CERN |
description | Isothermal and isochronal annealing experiments have shown that the I defect (the main cause for the changes in silicon diodes characteristics after high levels of gamma-irradiation) is stable up to 325–350°C. Possible reactions, which can explain the behavior of different defects formed during the annealing experiments, are discussed. All the experimental results concerning the I center (second-order irradiation induced defect, formed most likely via VO center, suppressed in oxygen rich material, high thermal stability) make it the favorite for being associated with the V$_2$O$_2$ complex. |
id | oai-inspirehep.net-1685710 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2003 |
record_format | invenio |
spelling | oai-inspirehep.net-16857102019-09-30T06:29:59Zdoi:10.1016/j.physb.2003.09.131http://cds.cern.ch/record/2634251engPintilie, IFretwurst, EKramberger, GLindstroem, GLi, ZStahl, JSecond-order generation of point defects in highly irradiated float zone silicon—annealing studiesDetectors and Experimental TechniquesIsothermal and isochronal annealing experiments have shown that the I defect (the main cause for the changes in silicon diodes characteristics after high levels of gamma-irradiation) is stable up to 325–350°C. Possible reactions, which can explain the behavior of different defects formed during the annealing experiments, are discussed. All the experimental results concerning the I center (second-order irradiation induced defect, formed most likely via VO center, suppressed in oxygen rich material, high thermal stability) make it the favorite for being associated with the V$_2$O$_2$ complex.oai:inspirehep.net:16857102003 |
spellingShingle | Detectors and Experimental Techniques Pintilie, I Fretwurst, E Kramberger, G Lindstroem, G Li, Z Stahl, J Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title | Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title_full | Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title_fullStr | Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title_full_unstemmed | Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title_short | Second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
title_sort | second-order generation of point defects in highly irradiated float zone silicon—annealing studies |
topic | Detectors and Experimental Techniques |
url | https://dx.doi.org/10.1016/j.physb.2003.09.131 http://cds.cern.ch/record/2634251 |
work_keys_str_mv | AT pintiliei secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies AT fretwurste secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies AT krambergerg secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies AT lindstroemg secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies AT liz secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies AT stahlj secondordergenerationofpointdefectsinhighlyirradiatedfloatzonesiliconannealingstudies |