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Use of electrodeposition for sample preparation and rejection rate prediction for assay of electroformed ultra high purity copper for $^{232}$Th and $^{238}$U prior to inductively coupled plasma mass spectrometry (ICP/MS)
The search for neutrinoless double beta decay in $^{76}$Ge has driven the need for ultra-low background Ge detectors shielded by electroformed copper of ultra-high radiopurity (<0.1 μBq/kg). Although electrodeposition processes are almost sophisticated enough to produce copper of this purity, to...
| Autores principales: | , , , , , , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
2008
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1007/s10967-008-0716-5 http://cds.cern.ch/record/2744921 |