Use of electrodeposition for sample preparation and rejection rate prediction for assay of electroformed ultra high purity copper for $^{232}$Th and $^{238}$U prior to inductively coupled plasma mass spectrometry (ICP/MS)

The search for neutrinoless double beta decay in $^{76}$Ge has driven the need for ultra-low background Ge detectors shielded by electroformed copper of ultra-high radiopurity (<0.1 μBq/kg). Although electrodeposition processes are almost sophisticated enough to produce copper of this purity, to...

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Detalles Bibliográficos
Autores principales: Hoppe, E W, Aalseth, C E, Brodzinski, R, Day, A R, Farmer, O T, Hossbach, T W, McIntyre, J I, Miley, H S, Mintzer, E E, Seifert, A, Smart, J E, Warren, G A
Lenguaje:eng
Publicado: 2008
Materias:
Particle Physics - Experiment
Acceso en línea:https://dx.doi.org/10.1007/s10967-008-0716-5
http://cds.cern.ch/record/2744921

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