Enhancement of the Electroluminescence from Amorphous Er-Doped Al(2)O(3) Nanolaminate Films by Y(2)O(3) Cladding Layers Using Atomic Layer Deposition

Amorphous Al(2)O(3)-Y(2)O(3):Er nanolaminate films are fabricated on silicon by atomic layer deposition, and ~1530 nm electroluminescence (EL) is obtained from the metal-oxide-semiconductor light-emitting devices based on these nanofilms. The introduction of Y(2)O(3) into Al(2)O(3) reduces the electric field for Er excitation and the EL performance is significantly enhanced, while the electron injection of devices and the radiative recombination of doped Er(3+) ions are not impacted. The 0.2 nm Y(2)O(3) cladding layers for Er(3+) ions increase the external quantum efficiency from ~3% to 8.7% and the power efficiency is increased by nearly one order of magnitude to 0.12%. The EL is ascribed to the impact excitation of Er(3+) ions by hot electrons, which stem from Poole-Frenkel conduction mechanism under sufficient voltage within the Al(2)O(3)-Y(2)O(3) matrix.