Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask

The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control th...

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Detalles Bibliográficos
Autores principales: Liu, Xiangyue, Zhang, Zhe, Song, Hongxuan, Huang, Qiushi, Huo, Tonglin, Zhou, Hongjun, Qi, Runze, Zhang, Zhong, Wang, Zhanshan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10055843/
https://www.ncbi.nlm.nih.gov/pubmed/36984933
http://dx.doi.org/10.3390/mi14030526

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10055843/
https://www.ncbi.nlm.nih.gov/pubmed/36984933
http://dx.doi.org/10.3390/mi14030526

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