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Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures
Ultra-short 230 fs laser pulses of a 515 nm wavelength were tightly focused onto 700 nm focal spots and utilised in opening ∼0.4–1 μm holes in alumina Al(2)O(3) etch masks with a 20–50 nm thickness. Such dielectric masks simplify the fabrication of photonic crystal (PhC) light-trapping patterns for...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10056451/ https://www.ncbi.nlm.nih.gov/pubmed/36984957 http://dx.doi.org/10.3390/mi14030550 |
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author | Maksimovic, Jovan Mu, Haoran Smith, Daniel Katkus, Tomas Vaičiulis, Mantas Aleksiejūnas, Ramūnas Seniutinas, Gediminas Ng, Soon Hock Juodkazis, Saulius |
author_facet | Maksimovic, Jovan Mu, Haoran Smith, Daniel Katkus, Tomas Vaičiulis, Mantas Aleksiejūnas, Ramūnas Seniutinas, Gediminas Ng, Soon Hock Juodkazis, Saulius |
author_sort | Maksimovic, Jovan |
collection | PubMed |
description | Ultra-short 230 fs laser pulses of a 515 nm wavelength were tightly focused onto 700 nm focal spots and utilised in opening ∼0.4–1 μm holes in alumina Al(2)O(3) etch masks with a 20–50 nm thickness. Such dielectric masks simplify the fabrication of photonic crystal (PhC) light-trapping patterns for the above-Lambertian performance of high-efficiency solar cells. The conditions of the laser ablation of transparent etch masks and the effects sub-surface Si modifications were revealed by plasma etching, numerical modelling, and minority carrier lifetime measurements. Mask-less patterning of Si is proposed using fs laser direct writing for dry plasma etching of Si. |
format | Online Article Text |
id | pubmed-10056451 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-100564512023-03-30 Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures Maksimovic, Jovan Mu, Haoran Smith, Daniel Katkus, Tomas Vaičiulis, Mantas Aleksiejūnas, Ramūnas Seniutinas, Gediminas Ng, Soon Hock Juodkazis, Saulius Micromachines (Basel) Article Ultra-short 230 fs laser pulses of a 515 nm wavelength were tightly focused onto 700 nm focal spots and utilised in opening ∼0.4–1 μm holes in alumina Al(2)O(3) etch masks with a 20–50 nm thickness. Such dielectric masks simplify the fabrication of photonic crystal (PhC) light-trapping patterns for the above-Lambertian performance of high-efficiency solar cells. The conditions of the laser ablation of transparent etch masks and the effects sub-surface Si modifications were revealed by plasma etching, numerical modelling, and minority carrier lifetime measurements. Mask-less patterning of Si is proposed using fs laser direct writing for dry plasma etching of Si. MDPI 2023-02-26 /pmc/articles/PMC10056451/ /pubmed/36984957 http://dx.doi.org/10.3390/mi14030550 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Maksimovic, Jovan Mu, Haoran Smith, Daniel Katkus, Tomas Vaičiulis, Mantas Aleksiejūnas, Ramūnas Seniutinas, Gediminas Ng, Soon Hock Juodkazis, Saulius Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title | Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title_full | Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title_fullStr | Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title_full_unstemmed | Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title_short | Laser-Patterned Alumina Mask and Mask-Less Dry Etch of Si for Light Trapping with Photonic Crystal Structures |
title_sort | laser-patterned alumina mask and mask-less dry etch of si for light trapping with photonic crystal structures |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10056451/ https://www.ncbi.nlm.nih.gov/pubmed/36984957 http://dx.doi.org/10.3390/mi14030550 |
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