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Low-Frequency Noise-Based Mechanism Analysis of Endurance Degradation in Al/αTiO(x)/Al Resistive Random Access Memory Devices

In this work, we analyze a resistive switching random access memory (RRAM) device with the metal–insulator–metal structure of Al/αTiO(x)/Al. The transport mechanism of our RRAM device is trap-controlled space-charge limited conduction, which does not change during the endurance test. As the number o...

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Detalles Bibliográficos
Autores principales: Lee, Jung-Kyu, Pyo, Juyeong, Kim, Sungjun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10058136/
https://www.ncbi.nlm.nih.gov/pubmed/36984197
http://dx.doi.org/10.3390/ma16062317

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