Effect of Mask Geometry Variation on Plasma Etching Profiles †

It is becoming quite evident that, when it comes to the further scaling of advanced node transistors, increasing the flash memory storage capacity, and enabling the on-chip integration of multiple functionalities, “there’s plenty of room at the top”. The fabrication of vertical, three-dimensional fe...

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Detalles Bibliográficos
Autores principales: Bobinac, Josip, Reiter, Tobias, Piso, Julius, Klemenschits, Xaver, Baumgartner, Oskar, Stanojevic, Zlatan, Strof, Georg, Karner, Markus, Filipovic, Lado
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10058362/
https://www.ncbi.nlm.nih.gov/pubmed/36985072
http://dx.doi.org/10.3390/mi14030665

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10058362/
https://www.ncbi.nlm.nih.gov/pubmed/36985072
http://dx.doi.org/10.3390/mi14030665

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