Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

[Image: see text] Area-selective atomic layer deposition using small-molecule inhibitors (SMIs) involves vapor-phase dosing of inhibitor molecules, resulting in an industry-compatible approach. However, the identification of suitable SMIs that yield a high selectivity remains a challenging task. Rec...

Descripción completa

Detalles Bibliográficos
Autores principales: Tezsevin, I., Maas, J. F. W., Merkx, M. J. M., Lengers, R., Kessels, W. M. M., Sandoval, T. E., Mackus, A. J. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10061919/
https://www.ncbi.nlm.nih.gov/pubmed/36921108
http://dx.doi.org/10.1021/acs.langmuir.2c03214

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10061919/
https://www.ncbi.nlm.nih.gov/pubmed/36921108
http://dx.doi.org/10.1021/acs.langmuir.2c03214

Ejemplares similares