A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography

[Image: see text] A novel molecular glass (TPSiS) with photoacid generator (sulfonium salt group) binding to tetraphenylsilane derivatives was synthesized and characterized. The physical properties such as solubility, film-forming ability, and thermal stability of TPSiS were examined to assess the s...

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Detalles Bibliográficos
Autores principales: Wang, Yake, Yuan, Jundi, Chen, Jinping, Zeng, Yi, Yu, Tianjun, Guo, Xudong, Wang, Shuangqing, Yang, Guoqiang, Li, Yi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10077460/
https://www.ncbi.nlm.nih.gov/pubmed/37033792
http://dx.doi.org/10.1021/acsomega.2c08112

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10077460/
https://www.ncbi.nlm.nih.gov/pubmed/37033792
http://dx.doi.org/10.1021/acsomega.2c08112

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