New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection

In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthe...

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Detalles Bibliográficos
Autores principales: Liu, Junjun, Kang, Wenbing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10097361/
https://www.ncbi.nlm.nih.gov/pubmed/37050212
http://dx.doi.org/10.3390/polym15071598

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10097361/
https://www.ncbi.nlm.nih.gov/pubmed/37050212
http://dx.doi.org/10.3390/polym15071598

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