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New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection

In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthe...

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Detalles Bibliográficos
Autores principales: Liu, Junjun, Kang, Wenbing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10097361/
https://www.ncbi.nlm.nih.gov/pubmed/37050212
http://dx.doi.org/10.3390/polym15071598
_version_ 1785024562186944512
author Liu, Junjun
Kang, Wenbing
author_facet Liu, Junjun
Kang, Wenbing
author_sort Liu, Junjun
collection PubMed
description In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthesized and characterized with ultraviolet spectrophotometry, Fourier transform infrared spectroscopy and gel permeation chromatography. These resins were also evaluated in CA resists by formulating the JB resin with a photoacid generator (PAG) and tested at 405 nm and 365 nm exposure wavelengths. The BOC protection ratio at approximately 25 mol% of the Novolak phenol group showed the best performance. The resist showed high sensitivity (approximately 190 mJ/cm(2)), high resolution and good alkali developer resistance with reliable repeatability, indicating the great practical potential of this JB resist system.
format Online
Article
Text
id pubmed-10097361
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-100973612023-04-13 New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection Liu, Junjun Kang, Wenbing Polymers (Basel) Article In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthesized and characterized with ultraviolet spectrophotometry, Fourier transform infrared spectroscopy and gel permeation chromatography. These resins were also evaluated in CA resists by formulating the JB resin with a photoacid generator (PAG) and tested at 405 nm and 365 nm exposure wavelengths. The BOC protection ratio at approximately 25 mol% of the Novolak phenol group showed the best performance. The resist showed high sensitivity (approximately 190 mJ/cm(2)), high resolution and good alkali developer resistance with reliable repeatability, indicating the great practical potential of this JB resist system. MDPI 2023-03-23 /pmc/articles/PMC10097361/ /pubmed/37050212 http://dx.doi.org/10.3390/polym15071598 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Liu, Junjun
Kang, Wenbing
New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title_full New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title_fullStr New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title_full_unstemmed New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title_short New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
title_sort new chemically amplified positive photoresist with phenolic resin modified by gma and boc protection
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10097361/
https://www.ncbi.nlm.nih.gov/pubmed/37050212
http://dx.doi.org/10.3390/polym15071598
work_keys_str_mv AT liujunjun newchemicallyamplifiedpositivephotoresistwithphenolicresinmodifiedbygmaandbocprotection
AT kangwenbing newchemicallyamplifiedpositivephotoresistwithphenolicresinmodifiedbygmaandbocprotection