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New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthe...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10097361/ https://www.ncbi.nlm.nih.gov/pubmed/37050212 http://dx.doi.org/10.3390/polym15071598 |