Resistless EUV lithography: Photon-induced oxide patterning on silicon

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its high resolution and throughput, but future progress in...

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Detalles Bibliográficos
Autores principales: Tseng, Li-Ting, Karadan, Prajith, Kazazis, Dimitrios, Constantinou, Procopios C., Stock, Taylor J. Z., Curson, Neil J., Schofield, Steven R., Muntwiler, Matthias, Aeppli, Gabriel, Ekinci, Yasin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2023
Materias:
Physical and Materials Sciences
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10115406/
https://www.ncbi.nlm.nih.gov/pubmed/37075116
http://dx.doi.org/10.1126/sciadv.adf5997

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10115406/
https://www.ncbi.nlm.nih.gov/pubmed/37075116
http://dx.doi.org/10.1126/sciadv.adf5997

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