Synthesis of TiO(2)/Al(2)O(3) Double-Layer Inverse Opal by Thermal and Plasma-Assisted Atomic Layer Deposition for Photocatalytic Applications

In comparison to conventional nano-infiltration approaches, the atomic layer deposition (ALD) technology exhibits greater potential in the fabrication of inverse opals (IOs) for photocatalysts. In this study, TiO(2) IO and ultra-thin films of Al(2)O(3) on IO were successfully deposited using thermal...

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Detalles Bibliográficos
Autores principales: Lemago, Hamsasew Hankebo, Addin, Feras Shugaa, Kárajz, Dániel Atilla, Igricz, Tamás, Parditka, Bence, Erdélyi, Zoltán, Hessz, Dóra, Szilágyi, Imre Miklós
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10141218/
https://www.ncbi.nlm.nih.gov/pubmed/37110896
http://dx.doi.org/10.3390/nano13081314

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10141218/
https://www.ncbi.nlm.nih.gov/pubmed/37110896
http://dx.doi.org/10.3390/nano13081314

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