A Numerical Study of an Ellipsoidal Nanoparticles under High Vacuum Using the DSMC Method

The semiconductor and display manufacturing process requires high precision. Therefore, inside the equipment, fine impurity particles affect the yield rate of production. However, since most manufacturing processes are performed under high-vacuum conditions, it is difficult to estimate particle flow...

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Detalles Bibliográficos
Autores principales: Jang, Jinwoo, Son, Youngwoo, Lee, Sanghwan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10142646/
https://www.ncbi.nlm.nih.gov/pubmed/37421011
http://dx.doi.org/10.3390/mi14040778

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10142646/
https://www.ncbi.nlm.nih.gov/pubmed/37421011
http://dx.doi.org/10.3390/mi14040778

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