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A Numerical Study of an Ellipsoidal Nanoparticles under High Vacuum Using the DSMC Method
The semiconductor and display manufacturing process requires high precision. Therefore, inside the equipment, fine impurity particles affect the yield rate of production. However, since most manufacturing processes are performed under high-vacuum conditions, it is difficult to estimate particle flow...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10142646/ https://www.ncbi.nlm.nih.gov/pubmed/37421011 http://dx.doi.org/10.3390/mi14040778 |