Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors

Dense homogeneous nanocomposite TiSiCN coatings with a thickness of up to 15 microns and a hardness of up to 42 GPa were obtained by the method of reactive titanium evaporation in a hollow cathode arc discharge in an Ar + C(2)H(2) + N(2)-gas mixture with the addition of hexamethyldisilazane (HMDS)....

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Detalles Bibliográficos
Autores principales: Menshakov, Andrey, Bruhanova, Yulia, Skorynina, Polina, Medvedev, Anatoliy
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10143026/
https://www.ncbi.nlm.nih.gov/pubmed/37103801
http://dx.doi.org/10.3390/membranes13040374

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10143026/
https://www.ncbi.nlm.nih.gov/pubmed/37103801
http://dx.doi.org/10.3390/membranes13040374

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