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Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors
Dense homogeneous nanocomposite TiSiCN coatings with a thickness of up to 15 microns and a hardness of up to 42 GPa were obtained by the method of reactive titanium evaporation in a hollow cathode arc discharge in an Ar + C(2)H(2) + N(2)-gas mixture with the addition of hexamethyldisilazane (HMDS)....
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10143026/ https://www.ncbi.nlm.nih.gov/pubmed/37103801 http://dx.doi.org/10.3390/membranes13040374 |