Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns

Lift-off processing is a common method of pattern transfer for different nanofabrication applications. With the emergence of chemically amplified and semi-amplified resist systems, the possibilities for pattern definition via electron beam lithography has been widened. We report a reliable and simpl...

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Detalles Bibliográficos
Autores principales: Ohlin, Hanna, Frisk, Thomas, Vogt, Ulrich
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10145479/
https://www.ncbi.nlm.nih.gov/pubmed/37420999
http://dx.doi.org/10.3390/mi14040766

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10145479/
https://www.ncbi.nlm.nih.gov/pubmed/37420999
http://dx.doi.org/10.3390/mi14040766

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