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Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns
Lift-off processing is a common method of pattern transfer for different nanofabrication applications. With the emergence of chemically amplified and semi-amplified resist systems, the possibilities for pattern definition via electron beam lithography has been widened. We report a reliable and simpl...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10145479/ https://www.ncbi.nlm.nih.gov/pubmed/37420999 http://dx.doi.org/10.3390/mi14040766 |