Designing Highly Precise Overlay Targets for Asymmetric Sidewall Structures Using Quasi-Periodic Line Widths and Finite-Difference Time-Domain Simulation

The present study introduces an optimized overlay target design to minimize the overlay error caused by asymmetric sidewall structures in semiconductor manufacturing. To achieve this goal, the overlay error formula was derived by separating the asymmetric bottom grating structure into symmetric and...

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Detalles Bibliográficos
Autores principales: Hsieh, Hung-Chih, Wu, Meng-Rong, Huang, Xiang-Ting
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10181731/
https://www.ncbi.nlm.nih.gov/pubmed/37177682
http://dx.doi.org/10.3390/s23094482

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10181731/
https://www.ncbi.nlm.nih.gov/pubmed/37177682
http://dx.doi.org/10.3390/s23094482

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